Depth Profiling

 


Depth Profiling is a process where the element or chemical content of a sample is measured as a function of depth.  

Many analysis techniques that perform depth profiling use a beam of ions such as Ar+, Ga+, Cs+, or O2+.  Other depth profiling techniques use pulses of laser light, plasma beams, glow discharge or confocal manipulation of the sample in the Z axis.  The depth profile process involves the repeated removal (or in certain cases, the movement of the sample) down to the desired depth.

The "Y" axis of a depth profile plot represents the quantity of the element or chemical state measured at each measured depth.  The "X" axis of a depth profile plot represents the depths that were analyzed by the repeated cycling of ion beam, the laser pulse etc.

The expected thickness of the layers of interest and detection limits needed are important factors to consider before starting any depth profile.

 

Depth Profiling - Nanolab Technologies 

 

Based on many years of experience across many sample types, Nanolab Technologies has extensive knowledge on how to acquire depth profiles under optimized conditions without introducing artifacts.

 

First Choice Techniques

 

Second Choice Techniques

Confocal Raman Spectroscopy 



 

Confocal Raman Spectroscopy 



 

Atomic Concentration vs Sputtering Time Graph 



 

Hard Coating - Content vs Depth 

 

 

Intensity-Time Curve - Depth Profiling 

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News

Announced: August 25, 2015
Nanolab Technologies LEAPS Forward with High-Performance Analysis Services
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Announced: July 8, 2014
New XPS System with Argon Ion Clusters for Chemical State Depth Profiling
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