Depth Profiling is a process where the element or chemical content of a sample is measured as a function of depth.
Many analysis techniques that perform depth profiling use a beam of ions such as Ar+, Ga+, Cs+, or O2+. Other depth profiling techniques use pulses of laser light, plasma beams, glow discharge or confocal manipulation of the sample in the Z axis. The depth profile process involves the repeated removal (or in certain cases, the movement of the sample) down to the desired depth.
The “Y” axis of a depth profile plot represents the quantity of the element or chemical state measured at each measured depth. The “X” axis of a depth profile plot represents the depths that were analyzed by the repeated cycling of ion beam, the laser pulse etc.
The expected thickness of the layers of interest and detection limits needed are important factors to consider before starting any depth profile.
Based on many years of experience across many sample types, Nanolab Technologies has extensive knowledge on how to acquire depth profiles under optimized conditions without introducing artifacts.
First Choice Techniques
Second Choice Techniques
