Helios NanoLab 450 – FEI


Applications of FIB-SEM:

    • Using the FIB, cut the sample, then use the SEM to locate and image any defect
    • Cut a thin slice (30-50 nm), then lift it out, then image it using TEM/STEM with EDS/EELS to measure the chemistry

DualBeam™ - Nanolab Technologies 


The Helios NanoLab series is the world’s most advanced DualBeam™ platform for imaging, analysis, and TEM sample preparation in semiconductor failure analysis laboratories.

Created for advanced semiconductor labs that deal with numerous challenges, including shrinking dimensions at sub 32-nm nodes; advanced packaging techniques, and higher volume samples requiring TEM imaging.

Helios NanoLab 450 – FEI 


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