Applications of FIB-SEM:
- Using the FIB, cut the sample, then use the SEM to locate and image any defect
- Cut a thin slice (30-50 nm), then lift it out, then image it using TEM/STEM with EDS/EELS to measure the chemistry
The Helios NanoLab series is the world’s most advanced DualBeam™ platform for imaging, analysis, and TEM sample preparation in semiconductor failure analysis laboratories.
Created for advanced semiconductor labs that deal with numerous challenges, including shrinking dimensions at sub 32-nm nodes; advanced packaging techniques, and higher volume samples requiring TEM imaging.
