Dual Beam FIB

Dual Beam FIB

Eurofins Nanolab Technologies offers its customers Dual Beam FIB services.  Whether you are seeking to speed time-to-market, solve manufacturing problems or ensure regulatory compliance turn to Eurofins. We know how to bring the power of science to every phase of your product lifecycle.

A Dual Beam FIB system uses a beam of Ga+ ion to mill into the surface to locate a feature or defect of interest. The integrated SEM then uses a focused beam of electrons to image the sample in the chamber.

After identifying the location of a feature or defect, FIB-SEM is used to cross-section the defect with the FIB and examine it with the SEM.  This allows sectioning step by step through the defect area and determining the layers affected by the defect. FIB-SEM produces data images at 0.8 nm spatial resolution.

Typical uses of Dual Beam FIB-SEM include preparation of STEM/TEM lamella, cross-section inspections for production control, materials development, quality control, problem solving, failure analysis, reverse engineering, data storage, and optics.

Learn about FIB-SEM methods for cross-section imaging failure analysis and TEM sample preparation.

As part of the EAG Laboratory network, Eurofins Nanolab Technologies offers:

40+

Years of Experience

+2,500

State-of-the-Art Instruments

+4,000

Clients Worldwide

+20

Global Locations

Ask an Expert

Please submit your dual beam FIB inquiry online, and we’ll route it to the right technical expert. We reply to most online inquiries within two hours if received between 6 AM and 5 PM Pacific Standard Time.

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