Thin Film Characterization is a routine application at Nanolab Technologies. As a leader in materials analysis, Nanolab has helped hundreds of high-technology companies in their R&D and development efforts. Improving quality, performance, and trouble shooting is how Nanolab develops new and innovative ways to help clients reach their objectives.
Films Analyzed
Semiconductor Films
- Silicon, thermal silicon oxides, silicon nitride, and silicon oxynitride
- SiOC, SiOCN
- Atomic layer deposition (ALD) of metal oxides
- SiGe, GaAs, TiW, NiCr, FeCr, III-V and II-VI films
- Others
Photovoltaic and Solar Films
- Silicon films (single, polysilicon, and ribbon)
- CIG, CdS, Indium (In) and CIGS
- Mo, Cu, and other back contacts
- Others
Applications
- Depth profiling, line scan and XY mapping
- Elemental analysis
- Surface chemical analysis
- Non-destructive profiling by XPS (1-12 nm)
- Contamination analysis
Analytical Techniques
- 2-D X-ray Microscopy – Real Time X-ray (RTX)
- 3-D X-ray Tomography
- Electron Spectroscopy for Chemical Analysis (ESCA)
- Energy Dispersive X-ray Spectroscopy (EDS)
- Secondary Ion Mass Spectrometry (SIMS)
- Glow Discharge – Mass Spectroscopy (GD-MS)
- X-Ray Fluorescence (XRF)
- X-Ray Diffraction (XRD)
- X-ray Photoelectron Spectroscopy (XPS)