Thin Film Characterization

 

Thin Film Characterization is a routine application at Nanolab Technologies. As a leader in materials analysis, Nanolab has helped hundreds of high-technology companies in their R&D and development efforts. Improving quality, performance, and trouble shooting is how Nanolab develops new and innovative ways to help clients reach their objectives.

Films Analyzed

Semiconductor Films

    • Silicon, thermal silicon oxides, silicon nitride, and silicon oxynitride
    • SiOC, SiOCN
    • Atomic layer deposition (ALD) of metal oxides
    • SiGe, GaAs, TiW, NiCr, FeCr, III-V and II-VI films
    • Others
 

Photovoltaic and Solar Films

    • Silicon films (single, polysilicon, and ribbon)
    • CIG, CdS, Indium (In) and CIGS
    • Mo, Cu, and other back contacts
    • Others
 

Applications

    • Depth profiling, line scan and XY mapping
    • Elemental analysis
    • Surface chemical analysis
    • Non-destructive profiling by XPS (1-12 nm)
    • Contamination analysis
 

Analytical Techniques

To enable certain features and improve your experience with us, this site stores cookies on your computer. Please click Continue to provide your authorization and permanently remove this message.

To find out more, please see our privacy policy.